Equipment Department
AUTO-PUREX・Dehumidifier
02
AUTO-PUREX®
LQ / G / H2PSA
LQ / G / H2PSA
Adsorption purification device that enables extreme purification
For liquid (LQ type), Gas (G type), High-purity hydrogen (H₂PSA type)
For liquid (LQ type), Gas (G type), High-purity hydrogen (H₂PSA type)
Special
Low dew point
Made-to-order
AUTO-PUREX® LQ
- Adsorption purification device for liquid that enables extreme purification. We have many experience in Japan and overseas.
- Removing water and impurities contained in liquids and mixed liquids
- Abundant examples including paraffin-based, olefin-based, naphthen-based, aromatic hydrocarbons, vinyl monomers, and organic solvents
[System diagram]
[Example]
Purpose | Impurity content | |
---|---|---|
Inlet | Outlet | |
Dehydration of vinyl acetate | H2O 200ppm | H2O 200ppm |
Dehydration of trichlorethylene | H2O 320ppm | H2O 10ppm |
Dehydration of perkroll ethylene | H2O 100ppm | H2O 10ppm |
Dehydration of mixed xylene | H2O 飽和 | H2O 10ppm |
Dehydration of pentane octane mixture | H2O 飽和 | H2O 1ppm |
Dehydration of styrene hexane mixture | H2O 飽和 | H2O 10ppm |
Dehydration of benzene | H2O 飽和 | H2O 10ppm |
Dehydration of n-hexane | H2O 10ppm | H2O 1ppm |
Dehydration of isobutanol | H2O 100ppm | H2O 20ppm |
Dehydration of n-paraffin mixture | H2O 80ppm | H2O 1ppm |
Dehydration of butadiene | H2O 300ppm | H2O 10ppm |
Dehydration of dimethylamine (DMA) | H2O 5,000ppm | H2O 100ppm |
Dehydration of Dimethylformamide (DMF) | H2O 800ppm | H2O 10ppm |
Dehydration of isopropeel alcohol n-heptane mixture | H2O 60ppm | H2O 5ppm |
Dehydration of propylene | H2O 400ppm | H2O 10ppm |
AUTO-PUREX® G
- Adsorption purification equipment for gas that achieves outstanding purification
- We have a wide variety of experience for gases such as LNG, LPG, raw air, nitrogen, hydrogen, helium, CO₂, methane, ethylene and NH₃.
[System diagram] Open Type
[System diagram] Closed Type
[Example]
Purpose | Impurity content | |
---|---|---|
Inlet | Outlet | |
Dehydration of hydrogen gas | H2O Saturation | H2O 5ppm |
Dehydration of ethylene gas | H2O 320ppm | H2O 5ppm |
Raw material for air separation device Air dehydration carbon dioxide gas | H2O Saturation CO2 350ppm | H2O DP-70℃ CO2 5ppm |
Dehydration of CO gas, demethanolization | H2O Saturation MeOH 40ppm | H2O DP-70℃ MeOH 1ppm |
Dehydration of propylene and heptane mixed gas | H2O Saturation | H2O DP-50℃ |
Removal of methane in hydrogen gas | CH4 5% | CH4 0.5% |
Dehydration of mixed gas of CH₄, C₂H₄, CO, N₂ | H2O Saturation | H2O DP-60℃ |
Dehydration of propylene gas | H2O Saturation | H2O 51ppm |
Dehydration of high pressure CO₂ gas | H2O Saturation | H2O DP-50℃ |
Dehydration of argon gas | H2O RH50% | H2O DP-70℃ |
Dehydration of Freon gas | H2O Saturation | H2O DP-60℃ |
Dehydration of natural gas | H2O RH20% | H2O DP-60℃ |
Dehydration of vinyl chloride | H2O Saturation | H2O 10ppm |
Dehydration of inert gas | H2O Saturation | H2O DP-50℃ |
Dehydration of helium | H2O Saturation | H2O DP-60℃ |
AUTO-PUREX® H₂PSA
- Ultra-high purity, high yield hydrogen purification device of pressure swing adsorption purification method
- Suitable for a wide range of applications such as semiconductors, electronics, chemistry, food, and metallurgy
- Possible to be used as a high-purity hydrogen supply source in combination with a hydrogen generator that uses methanol as a raw material.
[System diagram]
[Example]
Supply gas | Methanol reforming gas | Hydrocarbon reforming gas | Electrolytic hydrogen | Unreacted recovered gas |
---|---|---|---|---|
Supply gas composition | H2:75 CO2:24 CO:1 | H2O:79 CO2:19 CO:1 CH4:1 | H2:99 more than N2:0.3 O2:0.2 | H2:90 CH4:10 N2:1000ppm |
Processing pressure | 1.47Mpa・G | 0.88Mpa・G | 1.47Mpa・G | 1.47Mpa・G |
Product hydrogen gas purity | 99.99% | 99.99% | 99.99% | 99.99% |
Hydrogen recovery rate | 75% | 70% | 78% | 80% |
Note
- Please contact us for the equipment specifications and capacity, which are designed and manufactured according to your request.
- Impurity content is specified value by the customer. The performance of this device easily keeps less than a fraction of these values.